The Asymmetric P-Nylon filter utilizes the proven defect-reducing Nylon membranes configured into a new, asymmetric pore geometry. This tapered pore design, with an open upstream structure and a fine downstream region, enables extremely low operating pressures. The Nylon Effect1, which has proven to significantly reduce microbridge and cone defects in 193 nm resist and BARC chemistries can now be applied to all lithography applications.

 Naturally hydrophilic (no surface modifications)
 Quick venting
 Integrity testable
 Low extractables
 Manufactured in a cleanroom environment
 Reduces defects by sieving and absorption
 100% integrity tested


For detailed information about this product, please refer to the data sheet. (To download this data sheet, select Download PDF in the left sidebar.)