The enhanced retention (ER) and improved non-dewetting properties of the Pall UltiKleen Excellar ER filter enable semiconductor makers to meet the new chemical process filtration requirements of 65 nanometer and 45 nanometer node manufacturing. Designed for critical single-pass point-of-use retention, the filter’s high flow rate makes it additionally suitable for recirculation bath applications.

The UltiKleen Excellar ER filter is manufactured using Pall’s breakthrough technology, Molecular Surface Tailoring (MST), for imparting non-dewetting characteristics to a PTFE membrane without adding a chemical layer to the media. This proprietary technology was first used in the UltiKleen™ Excellar filter, and has since been improved to enhance membrane retention and non-dewetting properties. The hyperfine pore design of the membrane provides significantly improved retention of deep submicron-size particles. MST also increases the membrane’s performance in aqueous chemistries, including hot SPM and SC-2 chemistries.

The Me-KleenSM cleaning process can be used to condition the filter to reduce total metal ion extractables to a low single digit ppb amount.

 Enhanced retention (ER) of particles
 Robust non-dewetting PTFE medium
 High flow rates
 Hyperfine porous media matrix design
 All ultra high purity fluoropolymer construction
 Low extractables (<30 ppb total in a 5% HCl extraction of 1.5 L for 24 hours)
 Provided prewet as standard
 100% Integrity tested
 Ultra low metal ion Me-KleenSM option

For detailed information about this product, please refer to the data sheet. (To download this data sheet, select Download PDF in the left sidebar.)