Gas Filtration and Purification for Display Manufacturing

Filtration

Removal of fine particles from both bulk and point-of-use gas streams is critical for the manufacture of liquid crystal displays. The efficiency of membrane, metal or ceramic filters in gaseous service is substantially different from that in liquid service. Pall gas filters are typically rated at 3 nm, the smallest particle that can be reliably measured using a condensation nucleus counter (CNC).

Types of Filtration Media and Configurations

Filters are available with PTFE, stainless steel, nickel or ceramic medium to meet the compatibility requirements of inert or corrosive gases in ambient or high temperature conditions.

A range of configurations from small to large assemblies (disposable metal housings containing a choice of filters), to disposable cartridges are available to meet all flow rate requirements.

 

Display OverviewDisplay - Applications
Display - Chemical Filtration
Display - Photolithography Filtration
Display - Liquid Crystal Filtration
Display - Gas Filtration and Purification
Display - Ultrapure Water Filtration

Diffusers

Gas diffusers are ideally suited for vent applications on load lock interfaces or other vacuum chambers where large volumes of gas are flowing through a small orifice in a short amount of time. Pall’s ChamberKleen™ diffusercombines a stainless steel filter and a unique diffuser membrane that allows flow in 360 degrees. This combination allows large volumes of gas to flow in a uniform manner, limiting the disturbance of particles in the chamber. Consequently, fast vent times can be achieved with little particle disturbance contributing to a high wafer throughput and overall equipment efficiency.

Purification

With increasing pixel density, impurities that did not cause serious problems in the past may now result in defects, compromising quality and reducing product yields. Molecular impurities, also known as gaseous or volatile impurities, have recently become of greater concern as sources of defects during PECVD and sputter operations. Common molecular impurities include moisture, oxygen, carbon dioxide, carbon monoxide and hydrocarbons. These impurities cannot be removed by particle filtration; they require a reactive bed of material for removal. The process of removing molecular impurities from the gas stream is known as gas purification.

AresKleen™ Technology

The AresKleen material is a totally inorganic medium that is very reactive to gaseous impurities. The technology enables our Pall Purifiers to reduce trace impurities to < 1 ppb for inert, noble, nonreactive, hydride, perfluorocarbon and corrosive gases.

Features and benefits of our purifiers include the following:

  • Room temperature operation, eliminating the need for an additional heat source.
  • A small, uniform substrate that provides for excellent bed packing, enabling installation of the purifiers in either the vertical or horizontal orientation.
  • Integral particle filters, which allow the purifiers to be used as drop-in retrofits for existing in-line particle filters, without the need for equipment modification.
  • Gas-specific media that can purify a variety of gases.

Purifier Products

Pall Purifiers are available to meet a broad range of flow rates.


Products for Gas Filtration in Display Manufacturing

Assemblies

Gaskleen® 6101 Series Filter Assembly
Gaskleen® 6101 Series Filter AssemblyThe filter assembly is designed for ≥ 3 nanometer (0.003 μm) filtration of process gases.



Gaskleen® IV Series Filter Assembly
Gaskleen® IV Series Filter AssemblyThis filter assembly is specifically designed for  3 nanometers (0.003 µm) filtration of ultra-high purity semiconductor process gases.


Gaskleen® Sealed In-Line Filter Assembly
Gaskleen® Sealed In-Line Filter AssemblyThis filter assembly is specifically designed for ≥ 3 nanometer (0.003 μm) filtration of processes with flow rates up to 200 scfm.
   

Gaskleen® V Series Filter Assembly
Gaskleen® V Series Filter AssemblyThis is Pall’s latest generation gas filter assembly, designed to provide filtration of ultrahigh-purity semiconductor process gases.

    
Maxi Gaskleen® 8202/9202 Series Filter Assembly
Maxi Gaskleen® 8202/9202 Series Filter AssemblyThis filter assembly is specifically designed for ≥ 3 nanometer (0.003 μm) filtration of high flow applications.

    
Micro Kleen-Change® Filter Assembly (Gas Filtration)
Micro Kleen-Change® Filter Assembly (Gas Filtration)This filter assembly is designed for low pressure ultra high purity, point-of-use gas applications.

    
Mini Gaskleen® Hi-Flow Filter Assembly
Mini Gaskleen® Hi-Flow Filter AssemblyThis filter assembly is designed for ultra-high-purity point-of-use gas filtration applications.

    
Mini Kleen-Change® Filter Assembly (Gas Filtration)
Mini Kleen-Change® Filter Assembly (Gas Filtration)This filter assembly is designed for low pressure ultra high purity point-of-use gas filtration applications.

    
Mini Ultramet-L® 1100 Series Assembly
Mini Ultramet-L® 1100 Series AssemblyThis assembly is designed for ≥ 3 nanometer (0.003 μm) filtration of semiconductor grade gases, and is ideally suited for point-of-use applications.

    
PFA Gaskleen® 6101 Series Filter Assembly
PFA Gaskleen® 6101 Series Filter AssemblyThis filter assembly is specifically designed for ≥ 3 nanometer (0.003 μm) filtration of oxygen and specialty gases.


Ultramet-L® 4000 Series Filter Assembly
Ultramet-L® 4000 Series Filter AssemblyThis filter assembly is a unique, all 316L stainless steel filter designed for ≥ 3 nanometer (0.003 μm) filtration of semiconductor process gases.

    
Ultramet-L® 4400 Series Assembly
Ultramet-L® 4400 Series AssemblyThis assembly is recommended for all applications with process gases that are compatible with 316L stainless steel or nickel.


PG Series Gaskleen® Gas Purifier Assemblies and Manifolds
PG Series Gaskleen® Gas Purifier Assemblies and ManifoldsThis assembly has been designed to handle process flow rates up to 1,000 slpm.



Filters

Emflon® Filter (Gas Filtration)
Emflon® Filter (Gas Filtration)This filter element is designed for ≥ 3 nanometer (0.003 μm) filtration of bulk gas applications found in the semiconductor industry.


Emflon® PF Filter (Gas Filtration)
Emflon® PF Filter (Gas Filtration)This is an all fluoro–polymer pleated filter designed for  3 nanometer (0.003 µm) filtration of bulk aggressive process gases.


Gasket-Sert Filter
Gasket-Sert™ FilterThis filter is designed to protect major components of gas panels employed in semiconductor gas distribution systems.


Gasket-Sert PSP Filter
Gasket-Sert™ PSP FilterThis filter is designed to protect major components of gas panels employed in semiconductor gas distribution systems.

    
High-Flow Emflon® Filter Element
High-Flow Emflon® Filter ElementThis filter is designed for bulk nitrogen and clean dry air applications in the LCD and semiconductor industries where flow rates exceed 2,000 Nm3/h / 1,000 SCFM.


Small Flow Emflon® Filter (Gas Filtration)
Small Flow Emflon® Filter (Gas Filtration)This filter element is designed for ≥ 3 nanometer (0.003 μm) filtration of inert gas applications used in the production of semiconductor devices.

    
Ultipleat® PK CDA Filter
Ultipleat® PK CDA FilterThis filter is designed for clean dry air and nitrogen applications in the LCD and semiconductor industries.  It is rated for flows up to 10,000 SLPM (353 SCFM).

 

Products for Gas Purification in Display Manufacturing

Purifiers

Gaskleen® 1 1/8'' C-Seal Gas Purifier
Gaskleen® ST PurifierThis purifier is designed to remove contamination from many process gases.



Gaskleen® II Gas Purifier
Gaskleen® II Gas PurifierThis purifier is designed to remove contamination from most process gases.



Gaskleen® SP Gas Purifier
Gaskleen® SP Gas PurifierThis purifier protects zirconium oxide (ZrO2) sensors used in oxygen analyzers.


    
Gaskleen® ST Purifier
Gaskleen® ST PurifierThis purifier is designed to remove contamination from many process gases.


    
Maxi Gaskleen® Gas Purifier
Maxi Gaskleen® Gas PurifierThis purifier is designed to remove contamination from most process gases.


    
Mini Gaskleen® Gas Purifier
This purifier it is designed to remove contamination from many process gases.