PG Series Gaskleen® Gas Purifier Assemblies and Manifolds

Pall's Gaskleen® PG purifier assemblies have been designed to handle process flow rates up to 1,000 slpm.

• An optional bypass manifold is available complete with isolation valves and backplate for easy mounting.
• Pall's purification materials are available in every standard configuration.
• All purifier assemblies contain an integral 316L stainless steel particle filter.
• 100% helium leak and pressure tested.
• No detectable metal contribution above background in HCl gas with HCLP material
• No detectable metal contribution above background in HBr gas with HBRP material

Products in this datasheet may be covered by one or more patents, including US 7,465,692

Assembly Flow Rates

• PG550: 75 slpm
• PG2400: 500 slpm
• PG11000: 1,000 slpm

Particle Filter Options

• PG550/PG2400: 0.4 μm or 0.003 μm
• PG11000: 0.4 μm

Connections

• ¹⁄₄ in. or ¹⁄₂ in. gasket seal (VCR¹ or compatible) male/male
• Inlet/outlet isolation valves (for PG11000)

Assembly Material

• Electropolished 316L SS
• <0.25 μm/<10 μin Ra internal surface finish

Operating Conditions

• Maximum operating pressure
  • PG550/PG2400: 3.45 MPa/500 psig
  • PG11000: 1.72 MPa/250 psig
• Maximum operating temperature:
  • 100 °C/212 °F (INP, SIP, FCP, SF6P)
  • 40 °C/104 °F (NH3P, GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
• EU Pressure Equipment Directive: Assemblies have been evaluated for compliance with the European Union's Pressure Equipment Directive 97/23/EC and are CE-marked.

¹ VCR is a trademark of Swagelok Co.

Technical Information

Impurity Removal as Tested in Specific Gases

Specific Gas	Impurity Removal Efficiency
Inert gases: nitrogen, argon, helium, xenon, krypton, neon	<1 ppb H2O, CO2, O2, and CO, as tested in argon and nitrogen using APIMS analyzer
Flammable gases: silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether	<1 ppb H2O, CO2, O2, and CO, as tested in argon, nitrogen and hydrogen using APIMS analyzer <1 ppb H2O, as tested in carbon monoxide using trace moisture analyzer H2O and siloxanes removed to trace levels, as tested in silane using APIMS
Carbon monoxide	<1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5, as tested in carbon monoxide using GC-ECD analyzer
Ammonia	<1 ppb H2O, CO2, and O2, as tested in argon using APIMS <12 ppb H2O, as tested in ammonia using NIR-TDLAS Removal of O2 and CO2 to trace levels, as tested in ammonia using GC-DID
Fluorocarbons: fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane	<1 ppb H2O, CO2, O2, and CO, as tested in argon and nitrogen using APIMS analyzer <1 ppb O2, as tested in trifluoromethane using trace oxygen analyzer <10 ppb H2O, as tested in trifluoromethane using trace moisture analyzer and FTIR
Germane	<1 ppb H2O, CO2, O2, and CO, as tested in argon and nitrogen using APIMS analyzer
Sulfur hexafluoride	<1 ppb H2O, CO2, and O2, as tested in argon using APIMS
Oxygenated gases: carbon dioxide, oxygen, nitrous oxide, clean dry air	<10 ppb H2O <1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Chlorinated gases: boron trichloride, chlorine, trichlorosilane, dichlorosilane	<100 ppb H2O <1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Halogenated gases: hydrogen chloride, hydrogen bromide	< 15 ppb H2O as tested in hydrogen chloride using CRDS < 50 ppb H2O as tested in hydrogen bromide using CRDS < 1 ppb H2O as tested in argon using APIMS analyzer
Photolithography clean dry air	< 1 ppb H2O as tested in argon using APIMS analyzer < 300 ppt C4H8 as tested in argon using APIMS Analyzer < 10 ppt SO2 as tested in nitrogen using ion chromatograph < 15 ppt NH3 as tested in nitrogen using ion chromatograph < 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction

Unit conversion: 1 bar = 100 kilopascals

Pressure Drop vs. Gas Flow Rate

PG550 with 0.003 μm filter


PG550 with 0.4 μm filter


PG2400___VMM4 with 0.003 μm filter


PG2400___VMM4 with 0.4 μm filter


PG2400___VMM8 with 0.003 μm filter


PG2400___VMM8 with 0.4 μm filter


PG11000 Series assembly


Note: For pressure drop information for a specific application, please contact Pall Microelectronics.

Lifetime Calculations

Pall AresKleenTM purification material: inert gas service
Gaskleen^® PG550 purifier assembly, part # GLP9INPVMM4

Inlet pressure: 207 kPa (30 psig) contaminant challenge as H₂O


Pall AresKleenTM purification material: inert gas service
Gaskleen^® PG11000 purifier assembly, part # GLP110INPVFM8

Inlet pressure: 207 kPa (30 psig) contaminant challenge as H₂O


Pall AresKleenTM purification material: inert gas service
Gaskleen® PG2400 purifier assembly, part # GLP24INPVMM4/VMM8

Inlet pressure: 207 kPa (30 psig) contaminant challenge as H₂O

List of Purifiable Gases

Gas Family	Material	Effluent Specification2
Nitrogen, argon, helium, xenon, krypton, neon	INP	<1 ppb H2O, O2, CO2 and CO
Silane, hydrogen, methane, cyclopropane, propane, dimethyl ether	SIP	<1 ppb H2O, O2, CO2 and CO
Carbon monoxide	SIP	<1 ppb H2O, O2, CO2, Ni(CO4), and Fe(CO)5
Fluoromethane, difluoromethane, trifluorine, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane	FCP	<1 ppb H2O, O2, CO2 and CO
Ammonia	NH3P	<1 ppb H2O, O2, CO2 and CO
Germane	GEH4P	<1 ppb H2O, O2, CO2 and CO
Sulfur hexafluoride	SF6P	<1 ppb H2O, O2, CO2 and CO
Air, carbon dioxide, oxygen, nitrous oxide	OXP	<10 ppb H2O
Boron trichloride, chlorine, trichlorosilane, dichlorosilane	CLXP	<100 ppb H2O
Hydrogen chloride	HCLP	<15 ppb H2O
Hydrogen bromide	HBRP	< 50 ppb H2O
Photolithography clean dry air	CDAP	< 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO

² As tested in inert gas.

Nominal Assembly Dimensions

Note: For manifold dimensions, please contact Pall Corporation.

Series	Part Number3	Description
PG550	GLP9xxxxFVMM4	Purifier assembly, 75 slpm, 0.003 μm filter, 1⁄4 in. gasket seal (VCR or compatible) male/male
	GLP9xxxxFMAN	Bypass manifold with GLP9xxxFVMM4 assembly
	GLP9xxxxFVMM4GCMAN	Gas cabinet manifold with GLP9xxxFVMM4 assembly
	GLP9xxxxVMM4	Purifier assembly, 75 slpm, 0.4 μm filter, 1⁄4 in. gasket seal (VCR or compatible) male/male
	GLP9xxxxMAN	Bypass manifold with GLP9xxxVMM4 assembly
	GLP9xxxxVMM4GCMAN	Gas cabinet manifold with GLP9xxxVMM4 assembly
PG2400	GLP24xxxxFVMM4	Purifier assembly, 300 slpm, 0.003 μm filter, 1⁄4 in. gasket seal (VCR or compatible) male/male
	GLP24xxxxFVMM8	Purifier assembly, 300 slpm, 0.003 μm filter, 1⁄2 in. gasket seal (VCR or compatible) male/male
	GLP24xxxxFMAN	Bypass manifold with GLP24xxxxFVMM8 assembly
	GLP24xxxxVMM4	Purifier assembly, 500 slpm, 0.4 μm filter, 1⁄4 in. gasket seal (VCR or compatible) male/male
	GLP24xxxxVMM8	Purifier assembly, 500 slpm, 0.4 μm filter, 1⁄2 in. gasket seal (VCR or compatible) male/male
	GLP24xxxxMAN	Bypass manifold with GLP24xxxxVMM8 assembly
PG11000	GLP110xxxxVFM84	Purifier assembly, 1,000 slpm, 0.4 μm filter, 1⁄2 in. gasket seal (VCR or compatible) female inlet/male outlet
	GLP110xxxxMAN4	Bypass manifold with GLP110xxxVMM8 assembly

³ See list of purifiable gases on page 1. Example: GLP9INPFVMM4.
⁴ The PG11000 stainless steel assembly (used with all GLP110 part numbers) is fabricated in accordance with the ASME BPVC Section VIII, Division 1, and has a U-stamp. If the user determines that an L-stamp is required for a lethal service application, please contact Pall Microelectronics for cost and availability.