Ultrapure Water Filtration for Semiconductor Manufacturing

Ultrapure Water Filtration /
Purification Requirements

Achieving and maintaining ultrapure water is extremely important in light of its widespread presence throughout the manufacture of semiconductor integrated circuits.

The technology of the industry has advanced so rapidly over the past few years that it has redefined cleanliness requirements, specifically with regard to the need for quantitatively removing colloidal silica, particles, total organic carbon (TOC), bacteria, pyrogens (bacterial fragments) and metal ions. 

A well-designed ultrapure water (UPW) system with strategically placed filters will ensure achievement of this goal, since the type of filter selected in each of the key areas will make a measurable difference in ultimate quality.

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Click to expand/collapse this sectionUPW Recommendations
Click to expand/collapse this sectionReverse Osmosis (RO) Pretreatment
Click to expand/collapse this sectionResin Trap Filters
Click to expand/collapse this sectionUltrafiltration Pre-Filter
Click to expand/collapse this sectionCentral/Loop Ultrafiltration (UF) Modules
Click to expand/collapse this sectionCentral/Loop Cartridge Filters
Click to expand/collapse this sectionPoint-of-Use (POU) Filters and Purifiers
Click to expand/collapse this sectionTank Vent Filters
Click to expand/collapse this sectionProcess Cooling Water
Click to expand/collapse this sectionConstruction Techniques
Click to expand/collapse this sectionSanitization Recommendations