Finer linewidths and increasingly complex processes continue to present new challenges for today’s semiconductor manufacturers. Impurities that did not cause serious problems in the past may now cause defects on the wafer, compromise process quality and reduce product yields. Molecular impurities, also known as gaseous or volatile impurities, have recently become of greater concern as sources of defects. Common molecular impurities include moisture, oxygen, carbon dioxide, carbon monoxide, hydrocarbons and metal carbonyls. These impurities cannot be removed by particle filtration; they require a reactive bed of material for removal. The process of removing molecular impurities from the gas stream is known as gas purification.



Please view the pdf below for application information and recommendations.

Gas Purification Introduction