Asymmetric Technology

Asymetric Technology

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The Pall asymmetric filter technology is designed to extend 0.02-micron and 0.04 mm filtration to a broader range of photolithography chemistries, including 193 nm and 248 nm photoresists and bottom anti reflective coatings. The asymmetric filter builds on the success of Pall's standard, P-Nylon filter, which has been proven to reduce cone defects in bottom anti-reflective coatings (BARC) and microbridge defects in 193nm photoresists. At Pall our focus on next generation products has allowed customers to achieve finer line widths while reducing defect densities.

Download the white paper ”Research of appropriate Filter Membrane for Reducing defects of ArF Lithography”

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