Crystalline Silicon Cell Processing
Chemical Filtration for Recirculating BathsPall filters can reduce particle contamination on wafer surfaces during the cleaning and etching steps.
Pall products can also protect critical orifices (i.e., cleaning nozzles), preventing them from becoming clogged and resulting in equipment downtime.
Fluid reclaim value can be maximized in a recirculating bath, by placing a filtration device in the loop. The life of the chemical bath can thus be extended through filtration. A cleaner bath can also improve the quality of the wafer surface.
Saw Damage Etching and Texturing
Filtration for Anti-Reflective CoatingMolecular contamination in the hydrogen and silane gases used to form the antireflective coatings or amorphous silicon films can lead to a number of process problems, such as non-uniform coatings and other types of defects arising from particle generation.
Gaskleen® II Purifiers reduce moisture and oxygen from hydrogen and silane gases to < 1 ppb. The purifier has also demonstrated the ability to remove trace levels of siloxanes and dopant metals such as As, P, Al and B from silane.
Read the related Application Bulletin: "Removal of Siloxane Impurities From Silane Gas in the Silicon Epitaxy Process" (PDF)