Gas Filtration and Purification for Semiconductor Manufacturing
As linewidths continue to shrink, the need for high-purity gases steadily increases. Pall’s line of gas filtration and purification products helps users achieve their most stringent purity needs.
Gas FiltrationWe offer the most extensive line of filtration products with media made of PTFE, stainless steel, nickel and ceramic which provide removal of particles > 3 nanometer (nm). Our stainless steel housing materials meet or exceed the industry standards for VAR material, allowing for highly polished, crevice free surfaces. Various product sizes can accommodate flow rates including point-of-use (POU) at the tool, the bulk delivery system and all points in between. Learn more . . .
Gas PurificationPurifiers remove molecular impurities including, but not limited to, moisture, oxygen, carbon dioxide, carbon monoxide, metal carbonyls and non-methane hydrocarbons. Our unique materials are able to remove these impurities to baseline levels from a wide range of gases including inerts, flammables, fluorocarbons, oxygenated, chlorinated, corrosives and others. All purifier assemblies contain an integral particle filter. Learn more . . .