Gas Filtration and Purification for Semiconductor Manufacturing

As linewidths continue to shrink, the need for high-purity gases steadily increases.  Pall’s line of gas filtration and purification products helps users achieve their most stringent purity needs.

Gas Filtration

We offer the most extensive line of filtration products with media made of PTFE, stainless steel, nickel and ceramic which provide removal of particles > 3 nanometer (nm).  Our stainless steel housing materials meet or exceed the industry standards for VAR material, allowing for highly polished, crevice free surfaces.  Various product sizes can accommodate flow rates including point-of-use (POU) at the tool, the bulk delivery system and all points in between. Learn more . . .

Gas Purification

Purifiers remove molecular impurities including, but not limited to, moisture, oxygen, carbon dioxide, carbon monoxide, metal carbonyls and non-methane hydrocarbons.  Our unique materials are able to remove these impurities to baseline levels from a wide range of gases including inerts, flammables, fluorocarbons, oxygenated, chlorinated, corrosives and others.  All purifier assemblies contain an integral particle filter. Learn more . . .
 

Semiconductor overview
Semiconductor - Applications
Semiconductor - Chemical
Semiconductor - CMP
Semiconductor - Gas Filtration and Purification
Semiconductor - Photolithography
Semiconductor - Ultrapure Water
Semiconductor - Wastewater Treatment
Semiconductor Application Literature