Lube for Data Storage Manufacturing
Filtration solutions that can effectively remove 3 nm and greater particles and have extremely low organic extractables are essential for this application.
Pall Corporation offers a variety of media and filtration technologies to meet both the particulate and extractable challenges of this application.
Lube Filtration and Purification Products for Data Storage
This filter is specifically designed for the filtration of ultra-highpurity chemicals with outstanding particle retention characteristics required by the semiconductor industry.
UltiKleen™-S Filter and UltiKleen-G2
This filter is an advanced all-fluoropolymer cartridge that is highly recommended for critical chemical filtration.
Ultipleat® P-Nylon Filter (Chemical Filtration)
This filter is specifically recommended for bulk filtration of photoresists and chemicals which are compatible with Nylon 6,6 and high density polyethylene (HDPE).
PurifiersIonKleen™ AQ Purifier
This purifier has been specifically designed for the removal of metal ions from ultrapure water. It is ideally suited for use in the semiconductor industry's most critical final cleaning processes.