Profile® II Filters for CMP Applications

Profile II filters effectively remove agglomerated particles and gels from oxide, tungsten and copper CMP slurries, while not affecting slurry particle distribution.
  • Depth filter with consistent, reproducible performance
  • Continuously profiled pore structure for built-in prefiltration and long service life
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles