Chemical Compatibility Guide

The compatibility data presented in the following Filtration Products Compatibility Guide is for general reference only.

Because so many factors can affect the chemical resistance of a given product, you should pretest under your own operating conditions, observing applicable safety practices such as those given on the Material Safety Data Sheet for each chemical.

In addition to consulting the guide for general compatibility information about materials, it is important to reference the individual housing rating for the various categories of fluids.

For example, the PP Megaplast™ housing only has a water rating and is not recommended for chemicals. For questions about compatibility for specific applications, please contact Pall Microelectronics.


 

Filtration Products Compatibility Guide


E - Excellent
G - Good at Ambient Temperatures
LR - Limited Recommendation
NR - Not Recommended

Please contact Pall Microelectronics for specific recommendations.
 

Semiconductor overview
Semiconductor - Applications
Semiconductor - Chemical
Semiconductor - CMP
Semiconductor - Gas Filtration and Purification
Semiconductor - Photolithography
Semiconductor - Ultrapure Water
Semiconductor - Wastewater Treatment Semiconductor Application LiteratureFind a Pall Distributor for Answers to Ordering Questions
Contact Pall Microelectronics for Answers to Technical Questions

Filter Cartridges Housings O-Rings
Ultipleat Depth
/
Profile UP
Ultipleat P-Nylon Emflon P Emflon Fluorodyne Ulti-Etch Fluoryte
/
UltiKleen
Ultipleat Mega-Etch
/
Ultipleat SP DR
PE-Kleen 316L SS Polypropylene PFA PVDF Fluoroelastomer Buna-N Fluoroelastomer
/
FEP
Silicone EPR Kalrez
Acids      
Acetic Acid (10%) G NR E E E E E G G E E E E G G E G G E
Acetic Acid, glacial LR NR E LR E E E G G E LR E E NR G E G G E
Hydrochloric Acid (conc.) G NR E E E E E G G NR LR E E G NR E NR NR E
Hydrofluoric Acid (49%) G NR E E E E E LR G NR LR E E G NR E NR NR E
Hydrofluoric Acid (dilute) G NR E E E E E G G NR G E E G NR E NR LR E
Hydrogen Peroxide (30%) LR NR G G G G E NR NR G LR E G G NR E LR LR E
Nitric Acid (conc.) NR NR NR NR NR NR E NR NR G LR E G G NR E LR LR E
Phosphoric Adic (conc.) LR NR G G G G E LR LR LR LR E G G NR E NR G E
Sulfuric Acid (conc.) NR NR NR LR LR NR E NR NR NR NR E G G NR E NR NR E
Bases      
Ammonium Fluoride (40%) LR G G E E E E G G NR LR E E G G E NR G E
Ammonium Hydroxide (conc.) G LR E G NR1 NR1 E G G LR G E NR1 LR NR E G G E
Potassium Hydroxide (conc.) G LR E G NR1 NR1 E G G LR G E NR1 LR LR E NR G E
Sodium Hydroxide (conc.) G LR E G NR1 NR1 E G G LR G E NR1 LR LR E NR G E
Tetramethyl Ammonium
Hydroxide (TMAH) (5%)
G LR E G NR1 NR1 E G G LR G E NR1 LR NR E LR LR E
Alcohols      
Butanol E E E E E E E LR G LR G E NR1 LR NR E LR LR E
Ethanol E E E E E E E LR G E E E E G LR E G G E
Ethylene Glycol E E E E E E E LR G E G E E G G E G G E
Glycerol E E E E E E E LR G E E E E G G E G G E
Isobutanol E E E E E E E LR G E E E E G G E G G E
Isopropanol (IPA) E E E E E E E LR G E E E E G G E G G E
Methanol E E E E E E E LR G E E E E LR G E G G E
Propylene Glycol G G G G G G E LR G E G E E G G E G G E
1 Not recommended for concentrated solutions.
2 Kalrez is a trademark of E. I. du Pont de Nemours and Company.


Filtration Products Compatibility Guide, cont'd.


E - Excellent
G - Good at Ambient Temperatures
LR - Limited Recommendation
NR - Not Recommended

Please contact Pall Microelectronics for specific recommendations.

Filter Cartridges Housings O-Rings
Ultipleat Depth
/
Profile UP
Ultipleat P-Nylon Emflon P Emflon Fluorodyne Ulti-Etch Fluoryte
/
UltiKleen
Ultipleat Mega-Etch
/
Ultipleat SP DR
PE-Kleen 316L SS Polypropylene PFA PVDF Fluoroelastomer Buna-N Fluoroelastomer
/
FEP
Silicone EPR Kalrez
Esters      
Butyl Acetate LR E G E NR NR E LR G G LR E NR NR NR E NR LR E
Cellusolve Acetate LR E G E NR NR E LR G G LR E NR NR NR E NR LR E
Ethyl Acetate LR E G E NR NR E LR G G LR E NR NR NR E NR LR E
Ethyl Lactate LR E G E NR NR E LR G G LR E NR NR NR E NR LR E
Halogenated Hydrocarbons      
Carbon Tetrachloride NR LR G3 LR LR LR E NR NR G NR E E G NR E NR NR G
Freon TF NR LR G3 LR LR LR E NR NR G NR E E G NR E NR NR NR
Methylene Chloride NR NR G3 LR LR LR E NR NR G NR E E H NR E NR NR G
Tetrachloroethylene
(Perchloroethylene)
NR LR G3 LR LR LR E NR NR G NR E E G NR E NR NR G
Trichloroethane
NR LR G3 LR LR LR E NR NR G NR E E G NR E NR NR G
Trichloroethylene
NR NR G3 NR LR LR E NR NR G NR E E G NR E NR NR G
Hydrocarbons      
Cyclohexane LR LR LR LR LR LR E LR LR G NR E E G G E NR NR E
Hexane LR LR LR LR LR LR E LR LR G NR E E G G E NR NR E
Pentane NR LR LR LR LR LR E LR LR G NR E E G G E NR NR E
Petroleum Ether LR LR LR LR LR LR E NR NR G NR E G G G E NR NR E
Toluene NR LR NR LR LR LR E NR NR G NR E G G NR E NR NR G
Xylene NR LR NR LR LR LR E NR NR G NR E G G NR E NR NR G
Ketones      
Acetone G G G G NR NR E NR LR G G E NR NR NR E NR G E
Cyclohexanone G G G G NR NR E NR LR G G E NR NR NR E NR G E
Methyl Ethyl Ketone (MEK) LR G G G NR NR E NR LR G LR E NR NR NR E NR G E
Methyl Isobutyl Ketone (MIBK) LR G G G NR NR E NR LR G LR E NR NR NR E NR LR E
3 Good rating for pre-extracted elements; otherwise, LR rating.


Filtration Products Compatibility Guide, cont'd.


E - Excellent
G - Good at Ambient Temperatures
LR - Limited Recommendation
NR - Not Recommended

Please contact Pall Microelectronics for specific recommendations.

Filter Cartridges Housings O-Rings
Ultipleat Depth
/
Profile UP
Ultipleat P-Nylon Emflon P Emflon Fluorodyne Ulti-Etch Fluoryte
/
UltiKleen
Ultipleat Mega-Etch
/
Ultipleat SP DR
PE-Kleen 316L SS Polypropylene PFA PVDF Fluoroelastomer Buna-N Fluoroelastomer
/
FEP
Silicone EPR Kalrez
Miscellaneous      
Dimethylsulfoxide
(DMSO)
LR G G G NR NR E G G G LR E NR NR NR E NR NR E
Hexamethyl-
disilazane
(HMDS)
LR LR G LR LR LR E G G G NR E LR NR NR E NR NR E
EGMEA LR G G G G G E LR G G NR E G NR NR E NR NR E
Silicone Oils G G G G G G E G G G G E E G G E NR G E
PEGMEA LR G G E G G E LR G G NR E G NR NR E NR NR E
Hydrocarbons      
Aqua Regia;
HNO3 : HCl
NR NR NR NR NR NR E NR NR NR NR E LR NR NR E NR NR E
BOE;
NH4F : HF
G NR G G E E E G G NR G E E G NR E NR NR E
NOE; Ethylene Glycol/
NH4F : H2O : Surfacant
G G E E E E E G G NR G E E G G E NR G E
Mixed Acid Etch; (HNO3<20%)
HNO3 : HF : CH3CO2H
LR NR LR NR LR LR E NR NR LR NR E E LR NR E NR NR E
Chrom Phos H2O : H3PO4 : CRO3 (32:1:0.1) LR NR G G G G E NR NR LR NR E E LR NR E NR NR E
N-Methyl Pyrrolidone; (NMP) LR NR G LR NR NR E NR NR G LR E NR NR NR E NR LR E
P-Etch; (3:5:92);
HNO3 : HF : DI H2O
LR NR G NR G G E NR NR G LR E G G NR E NR NR E
Piranha; H2SO4 : H2O2 NR NR NR NR NR NR E NR NR NR NR E LR NR NR E NR NR E
RCA Etch; (75:15:5:5) H3PO4 : CH3CO2: H: HNO3: DI H2O NR NR G NR G G E NR NR LR LR E G G NR E NR NR E
SC1 (RCA Clean) NH4OH : H2O2 : DI H2O NR NR LR LR NR NR E LR LR LR NR E G LR NR E NR NR E
SC2; HCl : H2O2 : DI H2O NR NR NR LR NR NR E LR LR LR NR E G LR NR E NR NR E