SPIE. ADVANCED LITHOGRAPHY + PATTERNING

Location San Jose Convention Center

City, State & Country San Jose, California, USA

Pall Booth #637

Event Summary

Our scientists will present papers:

Filter start-up study on HDPE membrane point-of-use filter for lithography application

By Toru Umeda

https://spie.org/advanced-lithography/presentation/Filter-start-up-study-on-HDPE-membrane-point-of-use/12957-82#_=

Filtration study with Nylon membrane for metal removal performance improvement

By Hirokazu Sakakibara

https://spie.org/advanced-lithography/presentation/Filtration-study-with-Nylon-membrane-for-metal-removal-performance-improvement/12957-109#_=_

Event Information https://spie.org/conferences-and-exhibitions/advanced-lithography-and-patterning

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Join us at a location near you to meet our experts and product specialists, and learn out how the latest technical innovations can improve both the efficiency and quality of your processes at all scales.

October 2024

Oct 2024

29 Tue

31 Thu

UltraFacility 2024

Renassance Phoenix Glendale Hotel, Phoenix

Pall hold two presentations on Thursday 31st October.

11:15 Technical Session : Sutainability & Operational Excellence

"Is reclaimed water the better UPW source? "

13:45 Technical Session : Ensuring Yield & Reliability

"Impact of UF Prefilters on Polish Loop Filter"

Presented by : Jochen Ruth

SLS Director, Microelectronics Europe, Pall GmbH

Co-authors : Gerd Heser

Application Manager UPW & Systems, Pall Corporation

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