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Pall Corporation Rolls Out New 5 nm Rated Asymmetric Nylon Filter

Advanced Filter Designed to Enhance Start-up and Reduce Defectivity and Tool Downtime

PORT WASHINGTON, NY, July 14, 2015 – Pall Corporation today introduced its new 5 nm Asymmetric Nylon filter designed for advanced patterning applications in semiconductor lithography processes.  The new filter was announced at SEMICON West in San Francisco. 
The filter, rated at 5 nm, is the cleanest and tightest Nylon 6,6 lithography filter Pall has ever developed, and specifically targets defects in the 10 nm semiconductor patterning process.  It delivers a step change in metal, particle, and organics contributions to the photochemical process.  The new filter has been specifically designed to reduce filter start-up and tool downtime, and minimize chemical waste associated with starting up finer lithography filters.
“Pall’s Nylon 6,6 lithography products are known for superior defect reduction capability,” said Steve Chisolm, President of Pall Microelectronics.  “The new 5 nm Asymmetric Nylon filter is the next step in removal capability while offering lower pressure drop and enhanced adsorption to further reduce defectivity.”

The 5 nm Asymmetric Nylon membrane is available in all point-of-use and bulk lithography filter configurations including the Pall quick-disconnect PhotoKleenEZD 3, EZD-3X, and EZD-3XL assemblies employed on today’s most advanced lithography coater systems.  The filters will enable significant advances in the effort to pattern at 14 nm and below. 

To learn more about the new 5 nm rated Asymmetric Nylon filter and other Pall Microelectronics technology solutions, please visit: 
About Pall Corporation
Pall Corporation (NYSE:PLL) is a filtration, separation and purification leader providing solutions to meet the critical fluid management needs of customers across the broad spectrum of life sciences and industry. Pall works with customers to advance health, safety and environmentally responsible technologies. The company’s engineered products enable process and product innovation and minimize emissions and waste. Pall Corporation is an S&P 500 company serving customers worldwide. Follow us on Twitter @PallCorporation or visit

Technical Contact:
Pall Microelectronics
Michael Mesawich
Vice President, Strategic Marketing for Lithography
Cell: (516) 644-6144
Media Contact:
Pall Industrial
Robert Emproto
Pall Industrial Communications
Telephone: (516) 801-9341

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