aggressively eliminating impurities
Wet Etch Clean Filters – Improving Display Substrate Cleanliness
Our Display Clean Filters are designed for wet etching, stripping, developing and cleaning applications for making TFT arrays, as well as the steps involved in the color filter process. Cleanliness solutions are available for different sterilization systems like recirculating chemical baths, high pressure jet sprays, and mechanical scrubbing systems used in high resolution display manufacturing. Membranes are offered in a wide variety of materials (polysulfone, polyether sulfone, polypropylene, ECTFE, PTFE and non de-wetting PTFE) to meet the particle removal needs specific to the display substrate sizes.
Customizable filters are designed to handle flow rates in excess of 300 LPM with a minimal footprint, to help reduce display manufacturing costs. High flow rate applications can effectively reduce and prevent defects from reaching the substrate surfaces while meeting the required removal retentions. Effective filtration is essential for keeping chemical baths free of particles in order to clean the display substrate effectively. Pall filters aggressively eliminate impurities in the cleaning chemicals to help meet GEN 10 and beyond requirements, as well as smaller substrate sizes.
Applications:
- Recirculating baths
- Single pass systems
- High velocity jet spray systems
- Quick dump rinse systems
- Mechanical scrubbing systems
Benefits:
- Enhanced process stability
- Designed for high flow applications
- Increased area/process efficiency
- Extended chemical life
- Reduction in display defects
- Meets GEN 10 and beyond requirements
Our Wet Etch clean filters eradicate defect causing contaminants from crucial cleaning systems. Contat a Pall expert and learn how you can better control your process conditions to improve operating efficiency and empower technological advances.
Contact our team of filtration experts for more information on improving the efficiency of your process.
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