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Contamination control of the liquids and gases used during manufacturing of GEN 8 Fabs

Display

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Display Applications

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display manufacturing filters

Engineered to meet your needs. Choose from a broad range of innovative and efficient applications.

Flat panel display producers are constantly challenged to make evermore cost effective displays. Manufacturers of TFT-LCD (thin-film transistor liquid crystal display) displays, which comprise over 80% of the global flat panel market, must keep introducing new fabrication technologies to achieve the demand for increased pixel resolution.  In order to meet these challenges, for GEN 8 Fabs and beyond, contamination control of the liquids and gases used during manufacturing is vital.

 

Whatever the application or requirement, we have the technology and expertise to enable the display manufacturer to reduce defects, minimize downtime, improve display quality and increase profitability.

 

The areal density in the data storage industry has increased to such a degree that contamination control has become extremely critical. Selection of the proper filter technology is of paramount importance to maximize yield, while keeping the cost per disk at the lowest possible level. We have the filtration technology, manufacturing experience and process knowledge to meet these requirements.

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DISPLAY Products

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CDA

In the complex display industry, CDA is used in a wide variety of processes and is essential to the efficiency of pneumatic systems. Particle contamination can rapidly accelerate wear on pneumatic systems and clog valves leading to increased downtime and operating costs.
In the complex display industry, CDA is used in a wide variety of processes and is essential to the efficiency of pneumatic systems. Particle contamination can rapidly accelerate wear on pneumatic systems and clog valves leading to increased downtime and operating costs.
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Cleaning

Pall Display Cleaning Systems eliminate the impurities and contaminants that lead to process excursions such as chemical reactions, surface defects, and ineffective cleaning. Pall offers an extensive list of chemically compatible filters for aggressive process chemicals (ozone water, HF, photo resists) with high flow and industry leading particle removal efficiency.
Pall Display Cleaning Systems eliminate the impurities and contaminants that lead to process excursions such as chemical reactions, surface defects, and ineffective cleaning. Pall offers an extensive list of chemically compatible filters for aggressive process chemicals (ozone water, HF, photo resists) with high flow and industry leading particle removal efficiency.
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Color Filter

Trapped particles, contaminants, bubbles and gels can cause non-uniformity to the surface of an LCD color filter. Control of harmful impurities is required to maintain depth uniformity, eliminate the chance of pinholes, and maximize general product quality.
Trapped particles, contaminants, bubbles and gels can cause non-uniformity to the surface of an LCD color filter. Control of harmful impurities is required to maintain depth uniformity, eliminate the chance of pinholes, and maximize general product quality.
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Gas filtration and purification

Pall’s Process Gas Filtration and Purification systems effectively remove particles and molecular impurities using industry leading technologies. These systems are engineered to decrease particles and impurities that reduce product yields from adding defects to critical display processes.
Pall’s Process Gas Filtration and Purification systems effectively remove particles and molecular impurities using industry leading technologies. These systems are engineered to decrease particles and impurities that reduce product yields from adding defects to critical display processes.
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Lithography

Pall lithography filters use a variety of proprietary membrane materials to minimize metallic contributions, gels and microbubble formations. An optimized filter design reduces chemical usage during start-up and minimizes defects on the wafer surface.
Pall lithography filters use a variety of proprietary membrane materials to minimize metallic contributions, gels and microbubble formations. An optimized filter design reduces chemical usage during start-up and minimizes defects on the wafer surface.
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ODF

Pall’s ODF Filtration Systems block and eradicate defect causing gelatinous particles and contaminants from liquid crystal (LC) material to reduce surface defects. Defects are reduced on critical LC surfaces by filters engineered for low pressure configurations and eliminate the presence of air bubbles, which cause defects during the liquid crystal one drop filling (ODF) process.
Pall’s ODF Filtration Systems block and eradicate defect causing gelatinous particles and contaminants from liquid crystal (LC) material to reduce surface defects. Defects are reduced on critical LC surfaces by filters engineered for low pressure configurations and eliminate the presence of air bubbles, which cause defects during the liquid crystal one drop filling (ODF) process.
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Organic materials and printing

Quality ink jet filtration needs to be optimized in order to achieve correct pigmentation and output repeatability while keeping costs at a minimum. Surface defects on the organic films and other problems caused by contaminants can be significantly reduced by implementation of Pall filtration systems. Pall offers cost-effective solutions to meet the needs of the OLED film manufacturer and is designed for high volume use with a small footprint.
Quality ink jet filtration needs to be optimized in order to achieve correct pigmentation and output repeatability while keeping costs at a minimum. Surface defects on the organic films and other problems caused by contaminants can be significantly reduced by implementation of Pall filtration systems. Pall offers cost-effective solutions to meet the needs of the OLED film manufacturer and is designed for high volume use with a small footprint.
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Wet etch chemicals

Pall Wet Etch Clean filters eliminate impurities and contaminants in high flow rate applications that lead to process excursions such as chemical reactions, surface defects, and ineffective cleaning resulting in lower display quality.
Pall Wet Etch Clean filters eliminate impurities and contaminants in high flow rate applications that lead to process excursions such as chemical reactions, surface defects, and ineffective cleaning resulting in lower display quality.
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Eliminating impurities.

Advanced Display Cleaning Systems Offer High Flow and Particle Removal

Pall Ultipleat® G2 SP DR filters are designed specifically for high flow and improved particle removal in critical surface preparation chemical baths such as HF and BOE. The SP DR filter has a highly asymmetrical membrane construction, developed using Pall’s proprietary membrane modeling technology (MMT), resulting in pore size distribution uniformly transitioning from microporous to nanoporous throughout its depth. As a result, these filters retain particles down to 2 nanometers without flow restrictions.

 

Pall Ultipleat® G2 SP DR KC assemblies are completely disposable filter units ideally suited for etchant, low temperature stripping chemicals, and DI water filtration. These high-quality filters allow for MMT-enhanced dual retention of particles, superior HF filtration, and higher flow rates and longer life. The hyperfine microporous membrane matrix creates a high surface energy membrane for minimized microbubble formation. Users will also be able to prevent process contamination by using KC disposable assemblies.

 

Pall Display Clean Systems eradicate defect-causing contaminants from crucial cleaning systems. For more information, check out our microelectronics filters or contact a Pall expert, today. 

pall microelectronics

Pall provides filtration technology solutions for microelectronics display production.