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CMP & WET Users Group Meeting

More Microelectronics Events
Join us at a location near you to meet our experts and product specialists, and learn out how the latest technical innovations can improve both the efficiency and quality of your processes at all scales.
October 2024
UltraFacility 2024

Renassance Phoenix Glendale Hotel, Phoenix

Pall hold two presentations on Thursday 31st October.

 

11:15   Technical Session : Sutainability & Operational Excellence

          "Is reclaimed water the better UPW source? "

 

13:45  Technical Session : Ensuring Yield & Reliability

           "Impact of UF Prefilters on Polish Loop Filter"

 

Presented by : Jochen Ruth   

                          SLS Director, Microelectronics Europe, Pall GmbH

Co-authors :     Gerd Heser

                           Application Manager UPW & Systems, Pall Corporation

 

 

February 2024
SPIE. ADVANCED LITHOGRAPHY + PATTERNING

San Jose Convention Center, San Jose

Our scientists will present papers:

 

Filter start-up study on HDPE membrane  point-of-use filter for lithography application

By Toru Umeda

https://spie.org/advanced-lithography/presentation/Filter-start-up-study-on-HDPE-membrane-point-of-use/12957-82#_=

 

Filtration study with Nylon membrane  for metal removal performance improvement

By Hirokazu Sakakibara

https://spie.org/advanced-lithography/presentation/Filtration-study-with-Nylon-membrane-for-metal-removal-performance-improvement/12957-109#_=_