Process Gas Purification

Pall’s process gas purification systems remove impurities that can lead to defects on the wafer. Molecular impurities, also known as gaseous or volatile impurities, are becoming of greater concern as sources of defects, and can be effectively removed with Pall’s purification solutions. These purifiers work to expel impurities including moisture, oxygen, carbon dioxide, carbon monoxide, hydrocarbons and metal carbonyls by using a reactive bed of material. Impurities are expelled from the gas stream in areas where traditional particle filtering is ineffective. Our materials provide background level contaminant removal without contributing metals or other harmful contaminants to the process stream. All Pall purifier assemblies contain an integral filter for particle removal.

Applications:

• Inert gases
• Noble gases
• Nonreactive gases
• Hyydride gases
• Perfluorocarbon and corrosive gases.

Benefits:

• Enhanced process stability
• Increased area/process efficiency
• Reduction in defects
• Drop in retrofits to existing particle filters
• Custom media tailored to purify a variety of gases
• Low cost of ownership

Process gas purification systems and materials provide effective removal of impurities in areas where particle filtration is ineffective. Contact a Pall expert help you optimize your process gas purification systems and maximize your site’s performance by reducing defects and increasing yields.