Semiconductor

Our high-tech solutions have a broad range of applications for the semiconductor industry, including process gas filtration, trace moisture detection, ultrapure water, and wet etch and cleans. The chemical filtration and purification products that we develop and manufactures are the result of decades of experience serving the semiconductor and related industries.

We partner with suppliers and end users to provide chemical mechanical polishing (CMP) filtration solutions, and is continually working to develop more efficient and economic products that address the wide variety of slurries and applications. Semiconductor manufacturers choose Pall filtration and purification products for their process-enabling features, quality, cost reduction and productivity improvements.

A method to eliminate and minimize harmful molecular contaminants is essential in semiconductor manufacture, where traditional particle filtration is ofen ineffective. Pall’s high capacity purification systems provide molecular impurity removal with a long service life. Pall filters score high on particle retention, permeability, purity, and robustness. Applications in the semiconductor industry include integrated circuits, data storage, flat panel displays and photovoltaics.

We comply with the EPA 2010/15 PFOA Stewardship program and completely removed the use of PFOA (perfluorooctanoic acid) as a processing aid in the production of fluoropolymer materials. This program has been adopted globally by the largest fluoropolymer manufacturers and their end customers. The term “PFOA Free” indicates filter materials are not formulated using PFOA as a trace constituent. All fluoropolymer filter components for wet etch and clean applications have been qualified with PFOA free material.

Isopropyl alcohol (IPA) is a chemical commonly used for the wafer drying process in the semiconductor industry. The control level of contaminant in IPA is getting more stringent, as the feature size of the semiconductor devices decreases. Filtration plays an important role in reducing the contaminant, and we are  committed to offering the most advanced technology on the market to meet this need. Particle size removed by filter for IPA is required to be smaller in accordance with the control level of the contaminant. Another important requirement of filters used in IPA is to minimize extractables from the filters themselves. Polytetrafluoroethylene (PTFE) membrane filters are being used in more cases, in place of high-density polyethylene (HDPE) membrane filters.

Our purification and filtration technology for semiconductor applications offer advanced nanometer retention. For more information, view our semiconductor filters to see purchase information or talk to a Pall expert.